{"app_no":"105109999","patent_no":"I666888","title_zh":"極紫外光微影製程之光罩護膜結構與其製造方法","title_en":"Pellicle Structure for EUV Lithography and Method for Manufacturing the Same","patent_type":"I","status":"Lapsed","ipc_classes":"[\"H01L 21/027\", \"G03F 1/62\", \"B82Y 40/00\"]","applicant":"聯積半導體晶圓科技股份有限公司","annuity_date":"2026-10-30","r2_claims_key":"claims/105109999.md","risk_level":"HIGH","expert_notes":"【系統自動檢測】專利年費繳納截止日已過期，法律狀態轉為消滅失效。","updated_at":"2026-10-31 16:00:24"}