{"app_no":"105109999","patent_no":"I666888","title_zh":"極紫外光微影製程之光罩護膜結構與其製造方法","title_en":"Pellicle Structure for EUV Lithography and Method for Manufacturing the Same","patent_type":"I","status":"Active","ipc_classes":["H01L 21/027","G03F 1/62","B82Y 40/00"],"applicant":"聯積半導體晶圓科技股份有限公司","annuity_date":"2026-10-30","r2_claims_key":"claims/105109999.md","risk_level":"MEDIUM","expert_notes":"年費應繳日將於 53 天內屆滿 (2026-10-30)。"}